Web Menu

Product Search

Language

Products

China Wafer Handling Robotic Arm Manufacturer, Supplier, Factory

It is a good way to boost our products and solutions and repair. Our mission is always to establish artistic products and solutions to consumers having a excellent expertise for Wafer Handling Robotic Arm, Wafer Handling End Effector, wafer handling, wafer handling equipment, wafer handling tools, Our items have exported to North America, Europe, Japan, Korea, Australia, New Zealand, Russia and other countries. On the lookout ahead to make up a good and long-lasting cooperation with you in coming potential!
Wafer Handling Robotic Arm, Our advantages are our innovation, flexibility and reliability which have been built during last 20 years. We focus on providing service for our clients as a key element in strengthening our long-term relationships. The continual availability of high grade products and solutions in combination with our excellent pre- and after-sales service ensures strong competitiveness in an increasingly globalized market.

Related Products

Hot Products

  • PECVD Graphite Boat

    PECVD Graphite Boat

    Veteksemicon's PECVD graphite boat optimizes solar cell coating processes by spacing silicon wafers effectively and inducing glow discharge for uniform coating deposition. With advanced technology and material choices, Veteksemicon's PECVD graphite boats enhance silicon wafer quality and boost solar energy conversion efficiency.Pls no hesitate to inquiry us.
  • Aixtron MOCVD Susceptor

    Aixtron MOCVD Susceptor

    Vetek Semiconductor's Aixtron MOCVD Susceptor is used in the thin film deposition process of semiconductor production, especially involving MOCVD process. Vetek Semiconductor focuses on manufacturing and supplying high-performance Aixtron MOCVD Susceptor products. Welcome your inquiry.
  • SiC coating Monocrystalline silicon epitaxial tray

    SiC coating Monocrystalline silicon epitaxial tray

    SiC coating Monocrystalline silicon epitaxial tray is an important accessory for monocrystalline silicon epitaxial growth furnace, ensuring minimal pollution and stable epitaxial growth environment. VeTek Semiconductor's SiC coating Monocrystalline silicon epitaxial tray has an ultra-long service life and provides a variety of customization options. VeTek Semiconductor looks forward to becoming your long-term partner in China.
  • CVD SiC Coating Nozzle

    CVD SiC Coating Nozzle

    CVD SiC Coating Nozzles are crucial components used in the LPE SiC epitaxy process for depositing silicon carbide materials during semiconductor manufacturing. These nozzles are typically made of high-temperature and chemically stable silicon carbide material to ensure stability in harsh processing environments. Designed for uniform deposition, they play a key role in controlling the quality and uniformity of epitaxial layers grown in semiconductor applications. Welcome your further inquiry.
  • Porous Graphite with TaC Coated

    Porous Graphite with TaC Coated

    Porous Graphite with TaC Coated is an advanced semiconductor processing material provided by VeTek Semiconductor. Porous Graphite with TaC Coated combines the advantages of porous graphite and tantalum carbide (TaC) coating, with good thermal conductivity and gas permeability. VeTek Semiconductor is committed to providing quality products at competitive prices.
  • High purity CVD SiC raw material

    High purity CVD SiC raw material

    High purity CVD SiC raw material prepared by CVD is the best source material for silicon carbide crystal growth by physical vapor transport. The density of High purity CVD SiC raw material supplied by VeTek Semiconductor is higher than that of small particles formed by spontaneous combustion of Si and C-containing gases, and it does not require a dedicated sintering furnace and has a nearly constant evaporation rate. It can grow extremely high quality SiC single crystals. Looking forward to your inquiry.

  • Do you know about MOCVD Susceptor?

    This article mainly introduces the product types, product characteristics and main functions of MOCVD Susceptor in semiconductor processing, and makes a comprehensive analysis and interpretation of MOCVD Susceptor products as a whole.

  • How much do you know about CVD SiC ? - VeTek Semiconductor

    CVD SiC is a high-purity silicon carbide material manufactured by chemical vapor deposition. It is mainly used for various components and coatings in semiconductor processing equipment. The following content is an introduction to the product classification and core functions of CVD SiC

  • The top 3 quartz material suppliers in the world

    Quartz material is one of the essential materials for high-tech industries such as semiconductors and photovoltaics. This blog introduces the world's top three quartz material suppliers Sibelco, TQC and Momentive and their products.

  • What is Dishing and Erosion in the CMP Process?

    Chemical mechanical polishing (CMP) removes excess material and surface defects through the combined action of chemical reactions and mechanical abrasion. It is a key process for achieving global planarization of the wafer surface and is indispensable for multilayer copper interconnects and low-k dielectric structures. In practical manufacturing

  • What is the epitaxial process?

    This blog takes "What is the epitaxial process?" as its theme, and provides a detailed analysis from the dimensions of Overview of Epitaxial Processes, Types of Epitaxy, Factors Influencing the Epi Process, Epitaxial Growth Techniques, EPI Growth Modes, and Epitaxy Growth’s Importance.

  • Different technical routes of SiC epitaxial growth furnace

    Silicon carbide substrates have many defects and cannot be processed directly. A specific single crystal thin film needs to be grown on them through an epitaxial process to make chip wafers. This thin film is the epitaxial layer. Almost all silicon carbide devices are realized on epitaxial materials. High-quality silicon carbide homogeneous epitaxial materials are the basis for the development of silicon carbide devices. The performance of epitaxial materials directly determines the realization of the performance of silicon carbide devices.

Send Inquiry

X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept