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China Wafer Carrier Tray Manufacturer, Supplier, Factory

We keep on with the principle of "quality initial, service very first, ongoing improvement and innovation to meet the customers" for the administration and "zero defect, zero complaints" as the quality objective. To fantastic our assistance, we give the goods while using the fantastic high quality at the reasonable price for Wafer Carrier Tray, SiC coating, Monocrystalline silicon epitaxial tray, SiC coating Monocrystalline silicon epitaxial tray, silicon epitaxial growth, For more details, please get hold of us as soon as possible!
Wafer Carrier Tray, Our company has a skillful sales team, strong economic foundation, great technical force, advanced equipment, complete testing means, and excellent after-sales services. Our goods have beautiful appearance, fine workmanship and superior quality and win the unanimous approvals of the customers all over the world.

Hot Products

  • High purity CVD SiC raw material

    High purity CVD SiC raw material

    High purity CVD SiC raw material prepared by CVD is the best source material for silicon carbide crystal growth by physical vapor transport. The density of High purity CVD SiC raw material supplied by VeTek Semiconductor is higher than that of small particles formed by spontaneous combustion of Si and C-containing gases, and it does not require a dedicated sintering furnace and has a nearly constant evaporation rate. It can grow extremely high quality SiC single crystals. Looking forward to your inquiry.
  • CVD SiC Coating Nozzle

    CVD SiC Coating Nozzle

    CVD SiC Coating Nozzles are crucial components used in the LPE SiC epitaxy process for depositing silicon carbide materials during semiconductor manufacturing. These nozzles are typically made of high-temperature and chemically stable silicon carbide material to ensure stability in harsh processing environments. Designed for uniform deposition, they play a key role in controlling the quality and uniformity of epitaxial layers grown in semiconductor applications. Welcome your further inquiry.
  • Silicon Cassette Boat

    Silicon Cassette Boat

    The Silicon Cassette Boat from Veteksemicon is a precision-engineered wafer carrier developed specifically for high-temperature semiconductor furnace applications, including oxidation, diffusion, drive-in, and annealing. Fabricated from ultra-high-purity silicon and finished to advanced contamination-control standards, it provides a thermally stable, chemically inert platform that closely matches the properties of silicon wafers themselves. This alignment minimizes thermal stress, reduces slip and defect formation, and ensures exceptionally uniform heat distribution throughout the batch
  • Rapid Thermal Annealing Susceptor

    Rapid Thermal Annealing Susceptor

    VeTek Semiconductor is a leading Rapid Thermal Annealing Susceptor manufacturer and supplier in China, focusing on providing high-performance solutions for the semiconductor industry. We have many years of deep technical accumulation in the field of SiC coating materials. Our Rapid Thermal Annealing Susceptor has excellent high temperature resistance and excellent thermal conductivity to meet the needs of wafer epitaxial manufacturing. You are welcome to visit our factory in China to learn more about our technology and products.
  • TaC Coated Deep UV LED Susceptor

    TaC Coated Deep UV LED Susceptor

    TaC coating is a new generation coating develop for harsh environment.VeTek Semiconductor is an integrated supplier engaged in research and development, production, design, and sales of TaC coatings. We specialize in manufacturing edge-cutting TaC Coated UV LED Susceptors, which are crucial components in the LED epitaxy process. Our TaC Coated Deep UV LED Susceptor offer high thermal conductivity, high mechanical strength, improved production efficiency, and epitaxial wafer protection. Welcome to inquiry us.
  • Silicon Carbide Shower Head

    Silicon Carbide Shower Head

    Silicon Carbide Shower Head has excellent high temperature tolerance, chemical stability, thermal conductivity and good gas distribution performance, which can achieve uniform gas distribution and improve film quality. Therefore, it is usually used in high temperature processes such as chemical vapor deposition (CVD) or physical vapor deposition (PVD) processes. Welcome your further consultation to us ,vetek semiconductor.

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